IEEE Electron Device Letters · 2001 · 170 citations · 16 references
Electrical EngineeringMocvd-grown Npn Inp/gaassb/inpEngineeringRf SemiconductorHigh-frequency DeviceNanoelectronicsElectronic EngineeringApplied PhysicsConventional Inp/gainas-based DhbtsBv/sub Ceo/High Current CapabilityPower ElectronicsSaturation ModeMicroelectronicsOptoelectronicsSemiconductor Device
We report MOCVD-grown NpN InP/GaAsSb/InP abrupt double heterojunction bipolar transistors (DHBTs) with simultaneous values of f/sub T/ and f/sub MAX/ as high as 300 GHz for J/sub C/=410 kA/cm/sup 2/ at V/sub CE/=1.8 V. The devices maintain outstanding dynamic performances over a wide range of biases including the saturation mode. In this material system the p+ GaAsSb base conduction band edge lies 0.10-0.15 eV above the InP collector conduction band, thus favoring the use of nongraded base-collector designs without the current blocking effect found in conventional InP/GaInAs-based DHBTs. The 2000 /spl Aring/ InP collector provides good breakdown voltages of BV/sub CEO/=6 V and a small collector signal delay of /spl sim/0.23 ps. Thinner 1500 /spl Aring/ collectors allow operation at still higher currents with f/sub T/>200 GHz at J/sub C/=650 kA/cm/sup 2/.
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