A study on the Pt electrode etching for 0.15 μm technologies

Plasma Etching of RuO₂ Thin Films

Shinji Saito Kuramasu · Japanese Journal of Applied Physics · 1992 · 85 citations

Natural Sciences, Materials Engineering, Materials Science +17

High-Temperature Etching of PZT/Pt/TiN Structure by High-Density ECR Plasma

Seiichi Yokoyama, Yasuyuki Ito, Kazuya Ishihara et al. · Japanese Journal of Applied Physics · 1995 · 83 citations

Natural Sciences, Materials Engineering, Materials Science +17

Control of Etch Slope during Etching of Pt in Ar/Cl₂/O₂ Plasmas

Won Jong Yoo, Jin Hwan Hahm, Hyoun Woo Kim et al. · Japanese Journal of Applied Physics · 1996 · 66 citations

Engineering, Electrical Engineering, Microfabrication +16

Platinum Etching and Plasma Characteristics in RF Magnetron and Electron Cyclotron Resonance Plasmas

Kazuyasu Nishikawa, Yoshihiro Kusumi, Tatsuo Oomori et al. · Japanese Journal of Applied Physics · 1993 · 35 citations

Natural Sciences, Materials Science, Physics +16

High temperature platinum etching using Ti mask layer

Hyoun-Woo Kim, Byong-Sun Ju, B.Y. Nam et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1999 · 28 citations

Engineering, Materials Engineering, Materials Science +17