Preparation of hafnium oxide thin film by electron beam evaporation of hafnium incorporating a post thermal process

High-κ gate dielectrics: Current status and materials properties considerations

G. D. Wilk, Robert M. Wallace, J. Anthony · Journal of Applied Physics · 2001 · 5.9K citations

Engineering, Materials Engineering, Materials Science +17

Thermodynamic stability of binary oxides in contact with silicon

K. J. Hubbard, Darrell G. Schlom · Journal of materials research/Pratt's guide to venture capital sources · 1996 · 1.2K citations

Natural Sciences, Materials Engineering, Materials Science +14

Hafnium and zirconium silicates for advanced gate dielectrics

G. D. Wilk, Robert M. Wallace, J. Anthony · Journal of Applied Physics · 2000 · 972 citations

Engineering, Materials Engineering, Materials Science +17

Structure and stability of ultrathin zirconium oxide layers on Si(001)

M. Copel, M. Gribelyuk, Evgeni Gusev · Applied Physics Letters · 2000 · 667 citations

Natural Sciences, Materials Engineering, Materials Science +17

Thermal stability and electrical characteristics of ultrathin hafnium oxide gate dielectric reoxidized with rapid thermal annealing

Byoung Hun Lee, Laegu Kang, R. Nieh et al. · Applied Physics Letters · 2000 · 606 citations

Natural Sciences, Materials Engineering, Materials Science +17