2004 · 59 citations · 6 references
EngineeringElectrical EngineeringMicroelectronicsSemiconductor DevicesSemiconductor MaterialsComplementary Metal-oxide-semiconductor TechnologyDevice CharacterizationDopingMetal-oxide-semiconductor Field-effect TransistorsOxide SemiconductorsSemiconductor Device MaterialsBreakdown VoltageCharge Carrier DensityDoping UniformityInterstitial Doping
A RESURF stepped oxide (RSO) transistor is presented and electrically characterised. The processed RSO MOSFET includes a trench field-plate network in the drift region that is isolated with a thick oxide layer. This trench network has a hexagonal layout that induces an improved RESURF effect at breakdown compared with the more common stripe (2D) layout. Consequently, the effective doping can be two times higher for the hexagonal layout. We have obtained a record value for the specific on-resistance (R/sub ds,on/) of 58 m/spl Omega/.mm/sup 2/ at V/sub gs/=10 V for a breakdown voltage (BV/sub ds/,) of 85 V. These values have been obtained for devices having a 4.0 /spl mu/m cell pitch and a 5 /spl mu/m long drift region with a doping level of 2.10/sup 16/ cm/sup -3/. Measurements of the gate-drain charge density (Q/sub gd/) for these devices show that Q/sub gd/ is fully dominated by the oxide capacitance of the field-plate along the drift region.
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