Publication | Closed Access
Low temperature deposition of 2D WS<sub>2</sub> layers from WF<sub>6</sub> and H<sub>2</sub>S precursors: impact of reducing agents
79
Citations
25
References
2015
Year
Materials EngineeringMaterials ScienceChemical EngineeringTransition Metal ChalcogenidesEngineeringNanomaterialsNanotechnologySurface ScienceApplied PhysicsThin FilmsLayered MaterialChemical DepositionLow Temperature DepositionH2s PrecursorsChemical Vapor DepositionAtomic Layer Deposition
We demonstrate the impact of reducing agents for Chemical Vapor Deposition (CVD) and Atomic Layer Deposition (ALD) of WS2 from WF6 and H2S precursors. Nanocrystalline WS2 layers with a two-dimensional structure can be obtained at low deposition temperatures (300-450 °C) without using a template or anneal.
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