Concepedia

Single-layer Resist Processing

Single-Layer Resist Processing is a lithographic fabrication technique in electron beam lithography that employs a single resist layer to define patterned structures, distinguished from multilayer approaches by its simplicity, direct development, and avoidance of interlayer alignment or transfer steps.

25

Publications

1.1K

Citations

111

Authors

28

Institutions

Publications per year

2017–2026

1

Parents

Publications

25

Single-Step Optical Lift-Off Process

M. Hatzakis, B. J. Canavello, Jane M. Shaw · IBM Journal of Research and Development · 1980 · 211 citations

, , +13

X-ray lithography

A. Heuberger · Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena · 1988 · 127 citations

, , +13

Hydrogen silsesquioxane/novolak bilayer resist for high aspect ratio nanoscale electron-beam lithography

F.C.M.J.M. van Delft, J. Weterings, A. K. van Langen-Suurling et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2000 · 111 citations

, , +14

Fabrication of metal nanowires by atomic force microscopy nanoscratching and lift-off process

Yu‐Ju Chen, Ju-Hung Hsu, Heh‐Nan Lin · Nanotechnology · 2005 · 106 citations

, , +13

Low stress development of poly(methylmethacrylate) for high aspect ratio structures

M. J. Rooks, E. Kratschmer, R. Viswanathan et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2002 · 80 citations

, , +14

1–5 of 25

Authors

111

  1. AH
    A. Heuberger

    Fraunhofer Institute for Microengineering and Microsystems, Germany

    3 publications · 186 citations

    3

    h-index

  2. ON
    O. Nalamasu

    Alcatel Lucent (Germany), Germany

    2 publications · 36 citations

    2

    h-index

  3. ER
    Elsa Reichmanis

    Georgia Institute of Technology, United States

    2 publications · 36 citations

    2

    h-index

  4. JM
    J. M. Kometani

    AT&T (United States), United States

    2 publications · 36 citations

    2

    h-index

  5. AG
    Allen G. Timko

    Nokia (United States), United States

    2 publications · 36 citations

    2

    h-index

1–5 of 111

Institutions

28

  1. IBM Research - Thomas J. Watson Research Center

    Yorktown Heights, United States

    3 h-index

    7 publications

    884 citations

  2. Fraunhofer Institute for Microengineering and Microsystems

    Mainz, Germany

    3 h-index

    3 publications

    186 citations

  3. Massachusetts Institute of Technology

    Cambridge, United States

    2 h-index

    4 publications

    139 citations

  4. Hewlett-Packard (United States)

    Palo Alto, United States

    2 h-index

    13 publications

    223 citations

  5. IBM Research - Almaden

    San Jose, United States

    2 h-index

    6 publications

    441 citations

  6. IBM (United States)

    Armonk, United States

    2 h-index

    12 publications

    148 citations

  7. Technische Universität Berlin

    Berlin, Germany

    2 h-index

    2 publications

    159 citations

  8. National Tsing Hua University

    Hsinchu, Taiwan

    2 h-index

    6 publications

    387 citations

1–8 of 28

Venues

  1. 6

    h-index

  2. Microelectronic Engineering

    3 publications · 71 citations

    3

    h-index

  3. 3

    h-index

  4. 2

    h-index

  5. 2

    h-index

1–5