Shot Count Optimization
Shot Count Optimization is a methodological framework in computational imaging science that systematically determines the minimal number of electron or photon exposures required to achieve a desired resolution or signal-to-noise ratio in mask design, thereby balancing fabrication efficiency and patterning fidelity.
17
Publications
276
Citations
92
Authors
24
Institutions
Publications per year
2017–2026
0
Parents
17
CP element based design for 14nm node EBDW high volume manufacturing
Takashi Maruyama, Yasuhide Machida, Shinji Sugatani et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2012 · 19 citations
Engineering, Computer Engineering, Manufacturing Engineering +11
OPC simplification and mask cost reduction using regular design fabrics
Tejas Jhaveri, Ian Stobert, Lars W. Liebmann et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2009 · 18 citations
Engineering, Computer Engineering, Manufacturing Engineering +10
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24
The University of Tokyo
Tokyo, Japan
3 h-index
7 publications
113 citations
Mentor Technologies
Tulsa, United States
3 h-index
13 publications
134 citations
Institute of Systems, Information Technologies and Nanotechnologies
Fukuoka, Japan
2 h-index
3 publications
37 citations
Tokyo Electron (Japan)
Tokyo, Japan
2 h-index
4 publications
52 citations
JEOL (Japan)
Tokyo, Japan
2 h-index
5 publications
78 citations
Kyushu University
Fukuoka, Japan
2 h-index
7 publications
93 citations
Toshiba (Japan)
Tokyo, Japan
2 h-index
8 publications
138 citations
Carnegie Mellon University
Pittsburgh, United States
1 h-index
4 publications
72 citations
1–8 of 24
14 publications · 211 citations
11
h-index
1 publications · 15 citations
1
h-index
1 publications · 10 citations
JCTC · 1 publications · 13 citations
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