Concepedia

Resist Development

Resist Development is a microfabrication process in thin-film patterning that belongs to the class of lithographic techniques and is specifically distinguished by the selective removal of exposed or unexposed regions of a photosensitive resist layer following radiation exposure, thereby transferring the desired pattern into the resist for subsequent etching or deposition steps.

351

Publications

10.4K

Citations

1.2K

Authors

239

Institutions

Publications per year

2017–2026

22

Parents

Publications

351

Mechanism of Resist Pattern Collapse during Development Process

Toshihiko Tanaka, Mitsuaki Morigami, Nobufumi Atoda · Japanese Journal of Applied Physics · 1993 · 347 citations

, , +13

Single-Step Optical Lift-Off Process

M. Hatzakis, B. J. Canavello, Jane M. Shaw · IBM Journal of Research and Development · 1980 · 211 citations

, , +13

Using high-contrast salty development of hydrogen silsesquioxane for sub-10-nm half-pitch lithography

Joel K. W. Yang, Karl K. Berggren · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2007 · 206 citations

, , +13

Resist Materials and Processes for Extreme Ultraviolet Lithography

Toshiro Itani, Takahiro Kozawa · Japanese Journal of Applied Physics · 2012 · 185 citations · Full text

, , +14

Understanding of hydrogen silsesquioxane electron resist for sub-5-nm-half-pitch lithography

Joel K. W. Yang, B. Cord, Huigao Duan et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2009 · 181 citations · Full text

, , +13

1–5 of 351

Authors

1.2K

  1. TK
    Takahiro Kozawa

    The University of Osaka, Japan

    15 publications · 579 citations

    14

    h-index

  2. TI
    Toshiro Itani

    The University of Osaka, Japan

    12 publications · 377 citations

    11

    h-index

  3. CG
    C. Grant Willson

    The University of Texas at Austin, United States

    10 publications · 246 citations

    10

    h-index

  4. TH
    Theodore H. Fedynyshyn

    MIT Lincoln Laboratory, United States

    8 publications · 119 citations

    8

    h-index

  5. ST
    Seiichi Tagawa

    The University of Osaka, Japan

    8 publications · 281 citations

    8

    h-index

1–5 of 1.2K

Institutions

239

  1. IBM (United States)

    Armonk, United States

    15 h-index

    56 publications

    1.9K citations

  2. The University of Osaka

    Osaka, Japan

    14 h-index

    48 publications

    1.5K citations

  3. University of California, Berkeley

    Berkeley, United States

    13 h-index

    29 publications

    1.6K citations

  4. Cornell University

    Ithaca, United States

    13 h-index

    60 publications

    2.2K citations

  5. Intel (United States)

    Santa Clara, United States

    12 h-index

    39 publications

    736 citations

  6. IBM Research - Thomas J. Watson Research Center

    Yorktown Heights, United States

    12 h-index

    46 publications

    2K citations

  7. IBM Research - Almaden

    San Jose, United States

    12 h-index

    36 publications

    1.2K citations

  8. MIT Lincoln Laboratory

    Lexington, United States

    10 h-index

    48 publications

    997 citations

1–8 of 239

Venues

  1. 24

    h-index

  2. 22

    h-index

  3. Japanese Journal of Applied Physics

    JJAP · 26 publications · 1.1K citations

    15

    h-index

  4. Journal of Photopolymer Science and Technology

    29 publications · 564 citations

    14

    h-index

  5. Microelectronic Engineering

    19 publications · 401 citations

    13

    h-index

1–5