Concepedia

Overlay Alignment

Overlay Alignment is a precision registration technique in electron beam lithography that ensures accurate spatial correspondence between successive patterning layers by minimizing misalignment errors through fiducial marker-based positioning.

73

Publications

2.1K

Citations

403

Authors

75

Institutions

Publications per year

2017–2026

3

Variants

Overlay Registration

Parents

Publications

73

Sub-20-nm Alignment in Nanoimprint Lithography Using Moiré Fringe

Wei Wu, Stephen Y. Chou · Nano Letters · 2006 · 123 citations

, , +13

Electron-beam microcolumns for lithography and related applications

T. H. P. Chang, M. G. R. Thomson, E. Kratschmer et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1996 · 122 citations

, , +11

Fabrication of 60-nm transistors on 4-in. wafer using nanoimprint at all lithography levels

Wei Zhang, Stephen Y. Chou · Applied Physics Letters · 2003 · 120 citations

, , +16

Self-Aligned Memristor Cross-Point Arrays Fabricated with One Nanoimprint Lithography Step

Qiangfei Xia, J. Joshua Yang, Wei Wu et al. · Nano Letters · 2010 · 112 citations

, , +17

Fabrication of three-dimensional suspended, interlayered and hierarchical nanostructures by accuracy-improved electron beam lithography overlay

Gwanho Yoon, Inki Kim, Sunae So et al. · Scientific Reports · 2017 · 96 citations · Full text

, , +14

1–5 of 73

Authors

403

  1. PL
    Philippe Leray

    IMEC, Belgium

    4 publications · 71 citations

    4

    h-index

  2. TH
    T. H. P. Chang

    IBM Research - Thomas J. Watson Research Center, United States

    3 publications · 185 citations

    3

    h-index

  3. SV
    S. V. Sreenivasan

    The University of Texas at Austin, United States

    3 publications · 159 citations

    3

    h-index

  4. CG
    C. Grant Willson

    The University of Texas at Austin, United States

    3 publications · 159 citations

    3

    h-index

  5. HI
    Henry I. Smith

    Massachusetts Institute of Technology, United States

    3 publications · 73 citations

    3

    h-index

1–5 of 403

Institutions

75

  1. ASML (Netherlands)

    Veldhoven, The Netherlands

    10 h-index

    74 publications

    1.8K citations

  2. Princeton University

    Princeton, United States

    5 h-index

    15 publications

    984 citations

  3. KLA (Israel)

    Migdal HaEmeq, Israel

    5 h-index

    26 publications

    433 citations

  4. IMEC

    Leuven, Belgium

    4 h-index

    8 publications

    170 citations

  5. The University of Texas at Austin

    Austin, United States

    3 h-index

    22 publications

    1K citations

  6. Massachusetts Institute of Technology

    Cambridge, United States

    3 h-index

    11 publications

    249 citations

  7. Advanced Micro Devices (United States)

    Sunnyvale, United States

    3 h-index

    5 publications

    72 citations

  8. STMicroelectronics (France)

    Montrouge, France

    3 h-index

    8 publications

    108 citations

1–8 of 75

Venues

  1. 16

    h-index

  2. 8

    h-index

  3. Applied Physics Letters

    2 publications · 143 citations

    2

    h-index

  4. Journal of Vacuum Science and Technology

    2 publications · 39 citations

    2

    h-index

  5. Microelectronic Engineering

    2 publications · 20 citations

    2

    h-index

1–5