Overetching

Overetching is a thin film etching process in which material removal continues beyond the point required to completely remove the target layer, thereby risking unintended erosion of underlying layers or features due to excessive exposure to the etchant.

11

Publications

482

Citations

38

Authors

11

Institutions

Publications per year

2017–2026

1

Publications

11

1–5 of 11

Authors

38

  1. HA
    Hisahiro Ansai

    Sony (Taiwan), Taiwan

    2 publications · 34 citations

    2

    h-index

  2. TT
    Tetsuya Tatsumi

    The University of Osaka, Japan

    2 publications · 34 citations

    2

    h-index

  3. TK
    Takashi Kinoshita

    Chiba University, Japan

    2 publications · 34 citations

    2

    h-index

  4. SK
    Shöji Kobayashi

    Kagawa University, Japan

    2 publications · 34 citations

    2

    h-index

  5. NK
    Nobuyuki Kuboi

    Tokyo Electron (Japan), Japan

    2 publications · 34 citations

    2

    h-index

1–5 of 38

Venues

  1. 5

    h-index

  2. Applied Physics Express

    APEX · 1 publications · 17 citations

    1

    h-index

  3. Japanese Journal of Applied Physics

    JJAP · 1 publications · 17 citations

    1

    h-index

  4. IEEE Electron Device Letters

    1 publications · 16 citations

    1

    h-index

  5. Journal of The Electrochemical Society

    JES · 1 publications · 50 citations

    1

    h-index

1–5