Overetching
Overetching is a thin film etching process in which material removal continues beyond the point required to completely remove the target layer, thereby risking unintended erosion of underlying layers or features due to excessive exposure to the etchant.
11
Publications
482
Citations
38
Authors
11
Institutions
Publications per year
2017–2026
1
Parents
11
1–5 of 11
38
2
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2
h-index
2
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2
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2
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1–5 of 38
11
California Institute of Technology
Pasadena, United States
1 h-index
2 publications
502 citations

National Yang Ming Chiao Tung University
Hsinchu, Taiwan
1 h-index
2 publications
26 citations
SK Group (South Korea)
Seoul, South Korea
1 h-index
3 publications
150 citations
National Synchrotron Radiation Research Center
Hsinchu, Taiwan
1 h-index
1 publications
13 citations

Hanyang University
Seoul, South Korea
1 h-index
3 publications
150 citations
Advanced Micro Devices (United States)
Sunnyvale, United States
1 h-index
6 publications
96 citations
National Chi Nan University
Puli, Taiwan
1 h-index
2 publications
26 citations

Varian Medical Systems (United States)
Palo Alto, United States
1 h-index
4 publications
92 citations
1–8 of 11
5 publications · 321 citations
5
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APEX · 1 publications · 17 citations
1
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JJAP · 1 publications · 17 citations
1
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1 publications · 16 citations
1
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JES · 1 publications · 50 citations
1
h-index
1–5