Jun Komachi

Influence of hydrogen in silicon nitride films on the surface reactions during hydrofluorocarbon plasma etching

Nobuyuki Kuboi, Tetsuya Tatsumi, Hideki Minari et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2017 · 41 citations

Natural Sciences, Materials Engineering, Materials Science +17

Prediction of plasma-induced damage distribution during silicon nitride etching using advanced three-dimensional voxel model

Nobuyuki Kuboi, Tetsuya Tatsumi, Takashi Kinoshita et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2015 · 27 citations

Natural Sciences, Materials Engineering, Materials Science +17

Insights into different etching properties of continuous wave and atomic layer etching processes for SiO2 and Si3N4 films using voxel-slab model

Nobuyuki Kuboi, Tetsuya Tatsumi, Jun Komachi et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2019 · 18 citations

Engineering, Materials Engineering, Materials Science +17

Numerical Simulation Method for Plasma-Induced Damage Profile in SiO₂ Etching

Nobuyuki Kuboi, Tetsuya Tatsumi, Shöji Kobayashi et al. · Japanese Journal of Applied Physics · 2011 · 17 citations

Natural Sciences, Materials Engineering, Materials Science +17

Modeling and Simulation of Plasma-Induced Damage Distribution during Hole Etching of SiO$_{2}$ over Si Substrate by Fluorocarbon Plasma

Nobuyuki Kuboi, Tetsuya Tatsumi, Shöji Kobayashi et al. · Applied Physics Express · 2012 · 17 citations

Natural Sciences, Materials Engineering, Materials Science +17