Nobuyuki Kuboi

Future of plasma etching for microelectronics: Challenges and opportunities

G. S. Oehrlein, Stephan M. Brandstadter, Robert L. Bruce et al. · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena · 2024 · 103 citations · Full text

Materials Science, Electrical Engineering, Digital Twins +14

Prediction of Fluctuations in Plasma–Wall Interactions Using an Equipment Engineering System

Masanaga Fukasawa, Atsushi Kawashima, Nobuyuki Kuboi et al. · Japanese Journal of Applied Physics · 2009 · 39 citations

Excess Deposition, Engineering, Etch Rate +13

Influence of hydrogen in silicon nitride films on the surface reactions during hydrofluorocarbon plasma etching

Nobuyuki Kuboi, Tetsuya Tatsumi, Hideki Minari et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2017 · 38 citations

Engineering, Silicon On Insulator, Plasma Processing +16

Progress and perspectives in dry processes for nanoscale feature fabrication: fine pattern transfer and high-aspect-ratio feature formation

Taku Iwase, Yoshito Kamaji, Song Kang et al. · Japanese Journal of Applied Physics · 2019 · 33 citations

Engineering, Electron-beam Lithography, Pattern Transfer +21

Prediction of plasma-induced damage distribution during silicon nitride etching using advanced three-dimensional voxel model

Nobuyuki Kuboi, Tetsuya Tatsumi, Takashi Kinoshita et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2015 · 26 citations

Engineering, Sin Film, Plasma Processing +18