Mos Capacitance Simulation

MOS Capacitance Simulation is a computational modeling methodology that distinguishes itself by enabling the prediction and analysis of charge accumulation, depletion, and inversion behaviors in MOS capacitor structures through numerical solutions of semiconductor physics equations under varying bias conditions.

76

Publications

2.8K

Citations

248

Authors

104

Institutions

Publications per year

2017–2026

6

Authors

248

  1. RD
    R.W. Dutton

    Stanford University, United States

    6 publications · 585 citations

    6

    h-index

  2. CC
    Changhoon Choi

    Korea University, South Korea

    3 publications · 138 citations

    3

    h-index

  3. JP
    J.C.J. Paasschens

    Philips (Netherlands), Netherlands

    2 publications · 57 citations

    2

    h-index

  4. MG
    Michael Gaitan

    National Institute of Standards and Technology, United States

    2 publications · 26 citations

    2

    h-index

  5. AA
    A.C.T. Aarts

    Eindhoven University of Technology, Netherlands

    2 publications · 57 citations

    2

    h-index

1–5 of 248

Venues

  1. IEEE Transactions on Electron Devices

    16 publications · 570 citations

    14

    h-index

  2. IEEE Electron Device Letters

    7 publications · 339 citations

    7

    h-index

  3. Solid-State Electronics

    6 publications · 115 citations

    7

    h-index

  4. 5

    h-index

  5. Japanese Journal of Applied Physics

    JJAP · 3 publications · 82 citations

    3

    h-index

1–5