Mask Qualification is a methodological procedure in semiconductor manufacturing that verifies the integrity, fidelity, and process compatibility of a photomask to ensure its suitability for high-precision pattern transfer in lithography.
40
Publications
825
Citations
184
Authors
53
Institutions
Publications per year
2017–2026
5
Parents
Publications
40
Laser plasma x-ray sources for microlithography
Mohamed Chaker, H. Pépin, V. Bareau et al. · Journal of Applied Physics · 1988 · 71 citations
1–5 of 40
Authors
184
- AW
3
h-index
- MM
3
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- GZ
3
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- TL
3
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- PY
3
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1–5 of 184
Institutions
53
Carl Zeiss (Germany)
Oberkochen, Germany
6 h-index
23 publications
294 citations
Intel (United States)
Santa Clara, United States
5 h-index
23 publications
331 citations
Lawrence Berkeley National Laboratory
Berkeley, United States
4 h-index
8 publications
126 citations
University of Edinburgh
Edinburgh, United Kingdom
3 h-index
12 publications
182 citations
Nikon (United Kingdom)
London, United Kingdom
3 h-index
5 publications
79 citations
IMEC
Leuven, Belgium
2 h-index
5 publications
117 citations
Luminex (United States)
Austin, United States
2 h-index
9 publications
234 citations
IBM (United States)
Armonk, United States
2 h-index
7 publications
222 citations
1–8 of 53
Venues
- Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
20 publications · 357 citations
13
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- Microsystem Technologies
2 publications · 27 citations
2
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- Japanese Journal of Applied Physics
JJAP · 1 publications · 53 citations
1
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- Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena
1 publications · 24 citations
1
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- Computers in Industry
1 publications · 19 citations
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