Osamu Suga - Concepedia

Author

Osamu Suga

National Institute of Advanced Industrial Science and Technology

Also Known As

O. SUGA, O. Suga, Osamu SUGA, Osamu Suga

Publications

571

Citations

H-Index

Concepts

All Affiliations

National Institute of Advanced Industrial Science and Technology

About

Osamu Suga is an author at National Institute of Advanced Industrial Science and Technology specializing in engineering, applied physics, and microelectronics.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	12	16	305
2	Medicine	2	2	73
3	Education	1	1	21
4	Health Sciences	1	1	42
5	Management	1	1	50

Osamu Suga

Publications

347

Citations

H-Index

Page 1

	Year	Citations
Selete's EUV program: progress and challenges Ichiro Mori, Osamu Suga, Iwao Nishiyama, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE EngineeringLithography DesignLithography IntegrationElectron-beam LithographyRelated Mask Technology	2008	50
Development of actinic full-field EUV mask blank inspection tool at MIRAI-Selete Tsuneo Terasawa, Takeshi Yamane, Toshihiko Tanaka, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Light Field ImagingOphthalmologyMicroscopyMedicineOptical Testing	2009	42
Development of new FIB technology for EUVL mask repair Fumio Aramaki, Takashi Ogawa, Osamu Matsuda, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Materials ScienceIon ImplantationEngineeringElectron-beam LithographyOphthalmology	2011	31
Actinic phase defect detection and printability analysis for patterned EUVL mask Tsuneo Terasawa, Takeshi Yamane, Toshihiko Tanaka, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE EngineeringElectron-beam LithographyMicroscopyMechanical EngineeringMultilayer Defects	2010	24
Carbon contamination of EUV mask: film characterization, impact on lithographic performance, and cleaning Yasushi Nishiyama, Toshihisa Anazawa, Hiroaki Oizumi, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Materials ScienceChemical EngineeringEngineeringDeposition CharacteristicsSurface Science	2008	23
Actinic Mask Blank Inspection and Signal Analysis for Detecting Phase Defects Down to 1.5 nm in Height Tsuneo Terasawa, Takeshi Yamane, Toshihiko Tanaka, Japanese Journal of Applied Physics EngineeringElectron-beam LithographyMeasurementMicroscopyOptical Testing	2009	21
Impact of mask absorber properties on printability in EUV lithography Takashi Kamo, Hajime Aoyama, Toshihiko Tanaka, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Materials ScienceEngineeringElectron-beam LithographyBeam LithographyMicrofabrication	2007	20
Actinic Phase Defect Detection for Extreme Ultraviolet Lithography Mask with Absorber Patterns Tsuneo Terasawa, Takeshi Yamane, Toshihiko Tanaka, Japanese Journal of Applied Physics Materials ScienceShort Wavelength OpticOptical MaterialsExtreme Ultraviolet LithographyEngineering	2010	17
Repair specification study for half-pitch 32-nm patterns for EUVL Hajime Aoyama, Tsuyoshi Amano, Yasushi Nishiyama, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Repair Specification StudyEngineeringElectron-beam LithographyElectronic Design AutomationMicroscopy	2007	17
Phase defect printability and actinic dark-field mask blank inspection capability analyses Tsuneo Terasawa, Takeshi Yamane, Takashi Kamo, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Electrical EngineeringPhase Defect PrintabilityEngineeringBeam LithographyNondestructive Testing	2011	16

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