Osamu Suga

Selete's EUV program: progress and challenges

Ichiro Mori, Osamu Suga, Iwao Nishiyama et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2008 · 50 citations

Engineering, Lithography Design, Lithography Integration +18

Development of actinic full-field EUV mask blank inspection tool at MIRAI-Selete

Tsuneo Terasawa, Takeshi Yamane, Toshihiko Tanaka et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2009 · 42 citations

Light Field Imaging, Ophthalmology, Microscopy +11

Development of new FIB technology for EUVL mask repair

Fumio Aramaki, Takashi Ogawa, Osamu Matsuda et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2011 · 31 citations

Materials Science, Ion Implantation, Engineering +14

Actinic phase defect detection and printability analysis for patterned EUVL mask

Tsuneo Terasawa, Takeshi Yamane, Toshihiko Tanaka et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2010 · 24 citations

Engineering, Electron-beam Lithography, Microscopy +18

Carbon contamination of EUV mask: film characterization, impact on lithographic performance, and cleaning

Yasushi Nishiyama, Toshihisa Anazawa, Hiroaki Oizumi et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2008 · 23 citations

Materials Science, Chemical Engineering, Engineering +9