Concepedia

Mask Defect Detection

Mask Defect Detection is a systematic method in semiconductor manufacturing that identifies deviations from design specifications in photomasks by analyzing imaging data to ensure pattern fidelity and prevent lithographic errors during integrated circuit fabrication.

64

Publications

1.1K

Citations

268

Authors

54

Institutions

Publications per year

2017–2026

8

Parents

Publications

64

Development of actinic full-field EUV mask blank inspection tool at MIRAI-Selete

Tsuneo Terasawa, Takeshi Yamane, Toshihiko Tanaka et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2009 · 42 citations

, , +11

At-wavelength extreme ultraviolet lithography mask inspection using a Mirau interferometric microscope

Tsuneyuki Haga, Hisataka Takenaka, Makoto Fukuda · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2000 · 35 citations

, , +13

RESCAN: an actinic lensless microscope for defect inspection of EUV reticles

Iacopo Mochi, Patrick Helfenstein, István Mohacsi et al. · Journal of Micro/Nanolithography MEMS and MOEMS · 2017 · 33 citations · Full text

, , +12

An automated mask inspection system—AMIS

Jan Brüning, Michael R. Feldman, T.S. Kinsel et al. · IEEE Transactions on Electron Devices · 1975 · 33 citations

, , +17

Actinic inspection of extreme ultraviolet programed multilayer defects and cross-comparison measurements

Kenneth A. Goldberg, Anton Barty, Yanwei Liu et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2006 · 30 citations

, , +13

1–5 of 64

Authors

268

  1. TT
    Tsuneo Terasawa

    National Institute of Advanced Industrial Science and Technology, Japan

    10 publications · 215 citations

    10

    h-index

  2. IM
    Iacopo Mochi

    Lawrence Berkeley National Laboratory, United States

    8 publications · 153 citations

    8

    h-index

  3. TA
    Tsuyoshi Amano

    University of Hyogo, Japan

    7 publications · 112 citations

    7

    h-index

  4. RH
    Ryoichi Hirano

    Ebara (Japan), Japan

    7 publications · 118 citations

    7

    h-index

  5. SI
    S. Iida

    Nagaoka University of Technology, Japan

    6 publications · 101 citations

    6

    h-index

1–5 of 268

Institutions

54

  1. Lawrence Berkeley National Laboratory

    Berkeley, United States

    11 h-index

    34 publications

    585 citations

  2. Intel (United States)

    Santa Clara, United States

    9 h-index

    24 publications

    326 citations

  3. Lawrence Livermore National Laboratory

    Livermore, United States

    6 h-index

    13 publications

    224 citations

  4. University of Hyogo

    Kobe, Japan

    5 h-index

    21 publications

    417 citations

  5. Ebara (Japan)

    Tokyo, Japan

    5 h-index

    20 publications

    358 citations

  6. Hoya (Japan)

    Tokyo, Japan

    4 h-index

    12 publications

    243 citations

  7. Paul Scherrer Institute

    Villigen, Switzerland

    4 h-index

    25 publications

    513 citations

  8. Carl Zeiss (Germany)

    Oberkochen, Germany

    4 h-index

    17 publications

    411 citations

1–8 of 54

Venues

  1. 15

    h-index

  2. 9

    h-index

  3. 6

    h-index

  4. Japanese Journal of Applied Physics

    JJAP · 4 publications · 72 citations

    4

    h-index

  5. Radioengineering

    1 publications · 15 citations

    1

    h-index

1–5