Imprint Lithography Simulation
Imprint Lithography Simulation is a computational modeling approach used in nanofabrication research that numerically predicts the physical and mechanical behavior of resist materials and mold interactions during the nanoimprint lithography process to optimize pattern transfer fidelity.
40
Publications
1.1K
Citations
149
Authors
35
Institutions
Publications per year
2017–2026
2
Parents
40
Study of the resist deformation in nanoimprint lithography
Yoshihiko Hirai, Masaki Fujiwara, Takahiro Okuno et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2001 · 145 citations
Natural Sciences, Materials Engineering, Materials Science +17
1–5 of 40
149
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4
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35
Osaka Prefecture University
Sakai, Japan
8 h-index
35 publications
1.7K citations
The University of Texas at Austin
Austin, United States
7 h-index
34 publications
978 citations
Motorola (United States)
Schaumburg, United States
3 h-index
24 publications
664 citations
Korea Institute of Machinery & Materials
Daejeon, South Korea
3 h-index
4 publications
168 citations
National Tsing Hua University
Hsinchu, Taiwan
2 h-index
5 publications
83 citations
Korea Advanced Institute of Science and Technology
Daejeon, South Korea
2 h-index
6 publications
144 citations
Louisiana State University
Baton Rouge, United States
2 h-index
7 publications
235 citations
University of Science and Technology of China
Hefei, China
2 h-index
10 publications
126 citations
1–8 of 35
6 publications · 148 citations
6
h-index
6 publications · 494 citations
6
h-index
5 publications · 76 citations
5
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JJAP · 3 publications · 51 citations
3
h-index
2 publications · 36 citations
2
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1–5