Imprint Lithography Simulation

Imprint Lithography Simulation is a computational modeling approach used in nanofabrication research that numerically predicts the physical and mechanical behavior of resist materials and mold interactions during the nanoimprint lithography process to optimize pattern transfer fidelity.

40

Publications

1.1K

Citations

149

Authors

35

Institutions

Publications per year

2017–2026

2

Publications

40

1–5 of 40

Authors

149

  1. YH
    Yoshihiko Hirai

    Osaka Prefecture University, Japan

    8 publications · 430 citations

    8

    h-index

  2. JM
    Jason Meiring

    The University of Texas at Austin, United States

    4 publications · 98 citations

    4

    h-index

  3. MY
    Masaaki Yasuda

    Osaka Prefecture University, Japan

    4 publications · 63 citations

    4

    h-index

  4. CG
    C. Grant Willson

    The University of Texas at Austin, United States

    4 publications · 114 citations

    4

    h-index

  5. HK
    Hiroaki Kawata

    Osaka Prefecture University, Japan

    4 publications · 63 citations

    4

    h-index

1–5 of 149