Hard Mask Etching

Hard Mask Etching is a microlithographic fabrication technique in which a durable, inorganic thin-film layer serves as a selective etch-resistant template to define and transfer high-aspect-ratio patterns into an underlying substrate during plasma etching processes.

133

Publications

3.4K

Citations

787

Authors

174

Institutions

Publications per year

2017–2026

Parents

Etching Processes

Publications

133

Long Low-Loss-Litium Niobate on Insulator Waveguides with Sub-Nanometer Surface Roughness

Rongbo Wu, Jian Xu, Jia Qi et al. · Nanomaterials · 2018 · 194 citations · Full text

Engineering, Electrical Engineering, Materials Science +17

One‐Step Direct‐Patterning Template Utilizing Self‐Assembly of POSS‐Containing Block Copolymers

Tomoyasu Hirai, Melvina Leolukman, Chi Chun Liu et al. · Advanced Materials · 2009 · 176 citations · Full text

Natural Sciences, Materials Engineering, Materials Science +17

Enhanced Lithographic Imaging Layer Meets Semiconductor Manufacturing Specification a Decade Early

Yu‐Chih Tseng, Anil U. Mane, Jeffrey W. Elam et al. · Advanced Materials · 2012 · 80 citations

Natural Sciences, Manufacturing Engineering, Materials Science +14

Fabrication of Novel MEMS Microgrippers by Deep Reactive Ion Etching With Metal Hard Mask

Alvise Bagolini, S. Ronchin, P. Bellutti et al. · Journal of Microelectromechanical Systems · 2017 · 79 citations

Engineering, Materials Engineering, Materials Science +17

Sub-0.1 μm nitride hard mask open process without precuring the ArF photoresist

Jin Su Kim, Yun-Sook Chae, W. S. Lee et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2003 · 68 citations

Engineering, Materials Engineering, Materials Science +17

1–5 of 133

Authors

787

TC
T. Chevolleau
Commissariat à l'Énergie Atomique et aux Énergies Alternatives, France
8 publications · 144 citations
8
h-index
NP
N. Possémé
Laboratoire d'Électronique des Technologies de l'Information, France
5 publications · 81 citations
5
h-index
MD
Maxime Darnon
Centre National de la Recherche Scientifique, France
4 publications · 62 citations
4
h-index
CW
Chee Won Chung
Inha University, South Korea
4 publications · 78 citations
4
h-index
OJ
O. Joubert
Centre National de la Recherche Scientifique, France
4 publications · 75 citations
4
h-index

1–5 of 787

Institutions

174

1–8 of 174

Venues

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena
18 publications · 381 citations
13
h-index
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
12 publications · 225 citations
11
h-index
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
8 publications · 158 citations
8
h-index
Nanotechnology
7 publications · 190 citations
7
h-index
Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena
7 publications · 161 citations
7
h-index

1–5