Melvina Leolukman - Concepedia

Author

Melvina Leolukman

University of Wisconsin–Madison

Also Known As

Melvina Leolukman

Publications

753

Citations

H-Index

Concepts

All Affiliations

University of Wisconsin–Madison Tokyo Institute of Technology

About

Melvina Leolukman is an author at University of Wisconsin–Madison specializing in engineering, polymer science, and materials science.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	8	8	727
2	Applied Physics	4	4	257
3	Chemical Engineering	2	2	181
4	Natural Sciences	1	1	174
5	Biomolecular Engineering	1	1	18

Melvina Leolukman

Publications

727

Citations

H-Index

Page 1

	Year	Citations
Perpendicular Orientation of Domains in Cylinder-Forming Block Copolymer Thick Films by Controlled Interfacial Interactions Eungnak Han, Karl O. Stuen, Melvina Leolukman, Macromolecules EngineeringThin Film Process TechnologyPolymer MaterialPerpendicular Pmma CylindersThin Film Processing	2009	194
One‐Step Direct‐Patterning Template Utilizing Self‐Assembly of POSS‐Containing Block Copolymers Tomoyasu Hirai, Melvina Leolukman, Chi Chun Liu, Advanced Materials Materials ScienceBlock Co-polymersEngineeringBlock CopolymersSelective Oxygen Plasma	2009	174
Hierarchical Self-Assembled Structures from POSS-Containing Block Copolymers Synthesized by Living Anionic Polymerization Tomoyasu Hirai, Melvina Leolukman, Sangwoo Jin, Macromolecules Materials ScienceChemical EngineeringBlock Co-polymersEngineeringPolyhedral Oligomeric Silsesquioxane	2009	170
Hierarchical Nanostructures of Organosilicate Nanosheets within Self-Organized Block Copolymer Films Tomoyasu Hirai, Melvina Leolukman, Teruaki Hayakawa, Macromolecules Materials ScienceBlock Co-polymersEngineeringHierarchical NanostructuresPolymer Nanotechnology	2008	112
Resist Free Patterning of Nonpreferential Buffer Layers for Block Copolymer Lithography Eungnak Han, Melvina Leolukman, Myungwoong Kim, ACS Nano EngineeringElectron-beam LithographyPattern TransferBlock CopolymerPmma Segment	2010	34
Influence of Architecture, Concentration, and Thermal History on the Poling of Nonlinear Optical Chromophores in Block Copolymer Domains Melvina Leolukman, Peerasak Paoprasert, Yao Wang, Macromolecules Optical MaterialsEngineeringNonlinear OpticsPolymer NanotechnologyResponsive Polymers	2008	18
Synthesis of Photoacid Generator-Containing Patternable Diblock Copolymers by Reversible Addition−Fragmentation Transfer Polymerization Yun Jun Kim, Huiman Kang, Melvina Leolukman, Chemistry of Materials Materials ScienceBlock Co-polymersEngineeringSelf-assemblyPolymer Science	2009	14
Pixelated chemically amplified resists: Investigation of material structure on the spatial distribution of photoacids and line edge roughness Young‐Hye La, Insik-In, Sang‐Min Park, Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena Block Copolymer PhotoresistsPtba MatrixEngineeringElectron-beam LithographyChemical Engineering	2007	11

Page 1