H.-J. Wann

CMOS scaling into the nanometer regime

Yuan Taur, D. A. Buchanan, Wei Chen et al. · Proceedings of the IEEE · 1997 · 889 citations

Engineering, Computer Engineering, Electrical Engineering +17

Effects of N/sub 2/O anneal and reoxidation on thermal oxide characteristics

Zhaowei Liu, H.-J. Wann, P.K. Ko et al. · IEEE Electron Device Letters · 1992 · 65 citations

Natural Sciences, Materials Engineering, Materials Science +16

A capacitorless DRAM cell on SOI substrate

H.-J. Wann, Chenming Hu · 2002 · 59 citations

Engineering, Computer Engineering, Electrical Engineering +16

Thermal stability of TiN metal gate prepared by atomic layer deposition or physical vapor deposition on HfO2 high-K dielectric

Lei Wu, H.Y. Yu, X. Li et al. · Applied Physics Letters · 2010 · 47 citations

Engineering, Materials Engineering, Materials Science +17

A 7.9/5.5 psec room/low temperature SOI CMOS

F. Assaderaghi, W. Rausch, A. Ajmera et al. · 2002 · 46 citations

Engineering, Electrical Engineering, Microelectronics +15