S. Magoshi

Electron-beam direct writing system EX-8D employing character projection exposure method

Kiyoshi Hattori, Ryoichi Yoshikawa, H. Wada et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1993 · 43 citations

Engineering, Computer Engineering, Electrical Engineering +16

A hp22 nm node low operating power (LOP) technology with sub-10 nm gate length planar bulk CMOS devices

Nobuaki Yasutake, K. Ohuchi, M. Fujiwara et al. · 2004 · 36 citations

Engineering, Electrical Engineering, Low-power Design +16

14 nm gate length CMOSFETs utilizing low thermal budget process with poly-SiGe and Ni salicide

A. Hokazono, K. Ohuchi, M. Takayanagi et al. · 2003 · 33 citations

Engineering, Electrical Engineering, Low-power Design +9

Throughput enhancement strategy of maskless electron beam direct writing for logic device

Ryoichi Inanami, S. Magoshi, S. Kousai et al. · 2002 · 26 citations

Engineering, Computer Engineering, Electrical Engineering +17