Ryoichi Yoshikawa - Concepedia

Author

Ryoichi Yoshikawa

Toshiba (Japan)

Also Known As

R. Yoshikawa, Ryoichi Yoshikawa, Ryoichi Yoshikawa Ryoichi Yoshikawa, Ryosuke Yoshikawa

Publications

214

Citations

H-Index

Concepts

All Affiliations

Toshiba (Japan)

About

Ryoichi Yoshikawa is an author at Toshiba (Japan) specializing in engineering, instrumentation, and electrical engineering.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	7	7	159
2	Applied Physics	3	3	68
3	Education	2	2	33
4	Medicine	1	1	12
5	Natural Sciences	1	1	14

Ryoichi Yoshikawa

Publications

159

Citations

H-Index

Page 1

	Year	Citations
5.7 A 132dB Single-Exposure-Dynamic-Range CMOS Image Sensor with High Temperature Tolerance Yorito Sakano, Takahiro Toyoshima, Ryosuke Nakamura, Electrical EngineeringEngineeringHigh Temperature ToleranceMixed-signal Integrated CircuitComputer Engineering	2020	47
Electron-beam direct writing system EX-8D employing character projection exposure method Kiyoshi Hattori, Ryoichi Yoshikawa, H. Wada, Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena EngineeringElectron-beam LithographyMicroscopyOptic DesignBeam Intensity Distribution	1993	43
Representative Figure Method for Proximity Effect Correction [II] Takayuki Abe, Satoshi Yamasaki, Toshio Yamaguchi, Japanese Journal of Applied Physics Geometric ModelingImage FormationImage AnalysisEngineeringMeasurement	1991	18
Triangular Shaped Beam Technique in EB Exposure System EX-7 for ULSI Pattern Formation Kiyoshi Hattori, Osamu Ikenaga, Syuichi Tamamushi, Japanese Journal of Applied Physics Electrical EngineeringEngineeringRectangular Shaped BeamElectron-beam LithographyMeasurement	1989	15
Representative Figure Method for Proximity Effect Correction Takayuki Abe, Satoshi Yamasaki, Ryoichi Yoshikawa, Japanese Journal of Applied Physics EngineeringElectron-beam LithographyMeasurementComputer-aided DesignLocalization	1991	14
The representative figure method for the proximity effect correction [III] Takayuki Abe, Satoshi Yamasaki, Ryoichi Yoshikawa, Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena Electrical EngineeringEngineeringProximity Effect CorrectionMeasurementCalibration	1991	12
EBM-8000: EB mask writer for product mask fabrication of 22nm half-pitch generation and beyond Shusuke Yoshitake, Takashi Kamikubo, Noriaki Nakayamada, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Electrical EngineeringEngineeringElectron-beam LithographyBeam LithographyMicrofabrication	2011	10

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