Ryoichi Yoshikawa

5.7 A 132dB Single-Exposure-Dynamic-Range CMOS Image Sensor with High Temperature Tolerance

Yorito Sakano, Takahiro Toyoshima, Ryosuke Nakamura et al. · 2020 · 47 citations

Electrical Engineering, Engineering, High Temperature Tolerance +9

Electron-beam direct writing system EX-8D employing character projection exposure method

Kiyoshi Hattori, Ryoichi Yoshikawa, H. Wada et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1993 · 43 citations

Engineering, Electron-beam Lithography, Microscopy +16

Representative Figure Method for Proximity Effect Correction [II]

Takayuki Abe, Satoshi Yamasaki, Toshio Yamaguchi et al. · Japanese Journal of Applied Physics · 1991 · 18 citations

Geometric Modeling, Image Formation, Image Analysis +11

Triangular Shaped Beam Technique in EB Exposure System EX-7 for ULSI Pattern Formation

Kiyoshi Hattori, Osamu Ikenaga, Syuichi Tamamushi et al. · Japanese Journal of Applied Physics · 1989 · 15 citations

Electrical Engineering, Engineering, Rectangular Shaped Beam +14

Representative Figure Method for Proximity Effect Correction

Takayuki Abe, Satoshi Yamasaki, Ryoichi Yoshikawa et al. · Japanese Journal of Applied Physics · 1991 · 14 citations

Engineering, Electron-beam Lithography, Measurement +16