Thorsten Hofmann

Electron-beam-based photomask repair

Klaus Edinger, Hans Becht, Johannes Bihr et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2004 · 78 citations

Engineering, Materials Engineering, Materials Science +15

Industrial perspective on focused electron beam-induced processes

T. Bret, Thorsten Hofmann, Klaus Edinger · Applied Physics A · 2014 · 35 citations

Natural Sciences, Manufacturing Engineering, Physics +12

Evidence of printing blank-related defects on EUV masks missed by blank inspection

R. Jonckheere, Dieter Van den Heuvel, T. Bret et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2011 · 21 citations

Engineering, Manufacturing Engineering, Materials Science +17

Predictive modeling of EUV-lithography: the role of mask, optics, and photoresist effects

Andreas Erdmann, Peter Evanschitzky, Feng Shao et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2011 · 15 citations

Engineering, Electrical Engineering, Materials Science +16

A novel electron-beam-based photomask repair tool

Klaus Edinger, Hans Becht, Rainer Becker et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2003 · 13 citations

Engineering, Electrical Engineering, Materials Science +17