Concepedia

T. Iinuma

TI

Statistics

Publications

8

Citations

488

H-Index

8

Active since

1992

Affiliations

Toshiba (Japan)(Current)

T. Iinuma is an author at Toshiba (Japan) specializing in semiconductor devices, materials science, and engineering.

Publications per year

1992–2003

8

Publications

8

Self-aligned nickel-mono-silicide technology for high-speed deep submicrometer logic CMOS ULSI

T. Morimoto, T. Ohguro, H.S. Momose et al. · IEEE Transactions on Electron Devices · 1995 · 275 citations

Engineering, Electrical Engineering, Materials Science +17

High performance 35 nm gate length CMOS with NO oxynitride gate dielectric and Ni salicide

S. Inaba, K. Okano, Shôichi Matsuda et al. · IEEE Transactions on Electron Devices · 2002 · 75 citations

Engineering, Electrical Engineering, Microelectronics +16

A study of nonequilibrium diffusion modeling-applications to rapid thermal annealing and advanced bipolar technologies

B. Baccus, T. Wada, N. Shigyo et al. · IEEE Transactions on Electron Devices · 1992 · 41 citations

Engineering, Materials Engineering, Materials Science +17

A NiSi salicide technology for advanced logic devices

T. Morimoto, H.S. Momose, T. Iinuma et al. · 2002 · 34 citations

Engineering, Electrical Engineering, Materials Science +15

Low-resistance ultrashallow extension formed by optimized flash lamp annealing

Toshihide Ito, K. Suguro, M. Tamura et al. · IEEE Transactions on Semiconductor Manufacturing · 2003 · 21 citations

Natural Sciences, Materials Engineering, Materials Science +13

1–5 of 8