Shiro Kusumoto

Sub-40-nm half-pitch double patterning with resist freezing process

Masafumi Hori, Tomoki Nagai, Atsushi Nakamura et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2008 · 54 citations

Engineering, Electron-beam Lithography, Pattern Transfer +16

Double patterning process with freezing technique

Goji Wakamatsu, Yusuke Anno, Masafumi Hori et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2009 · 24 citations

Numerical Analysis, Engineering, Electron-beam Lithography +19

Material design for immersion lithography with high refractive index fluid (HIF)

Takashi Miyamatsu, Yong Wang, Motoyuki Shima et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2005 · 22 citations

Engineering, Optic Design, Biomedical Engineering +19

IMS (Injection Molded Solder) Technology with Liquid Photoresist for Ultra Fine Pitch Bumping

Toyohiro Aoki, Kazushige Toriyama, Hiroyuki Mori et al. · IMAPSource Proceedings · 2014 · 22 citations

Engineering, Mechanical Engineering, Fine Pitch +16

Advanced materials for 193 nm immersion lithography

Shiro Kusumoto, Motoyuki Shima, Yong Wang et al. · Polymers for Advanced Technologies · 2006 · 19 citations

Materials Science, Chemical Engineering, Optical Materials +15