Concepedia
Statistics
Publications
91
Citations
3.5K
H-Index
33
Active since
1980
Affiliations
Hitachi (Japan)(Current)
Hosei University
University of Fukui
Kyoto University
Tokyo Institute of Technology
Tomoyoshi Mishima is an author at Hitachi (Japan) specializing in engineering, applied physics, and electrical engineering.
Top concepts
EngineeringApplied PhysicsElectrical EngineeringMaterial ScienceOptoelectronicsMicroelectronicsSemiconductorsPhysicsSurface SciencePhotonics
Publications per year
1980–2021
Vertical GaN p-n Junction Diodes With High Breakdown Voltages Over 4 kV
Hiroshi Ohta, Naoki Kaneda, Fumimasa Horikiri et al. · IEEE Electron Device Letters · 2015 · 215 citations
Wide-bandgap Semiconductor, Electrical Engineering, Engineering +9
1.7-kV and 0.55-$\text{m}\Omega \cdot \text {cm}^{2}$ GaN p-n Diodes on Bulk GaN Substrates With Avalanche Capability
Kazuki Nomoto, Bo Song, Zongyang Hu et al. · IEEE Electron Device Letters · 2015 · 187 citations
Wide-bandgap Semiconductor, Electrical Engineering, Engineering +10
Power-generation performance of lead-free (K,Na)NbO3 piezoelectric thin-film energy harvesters
Isaku Kanno, Tomoharu Ichida, Kazuhiko Adachi et al. · Sensors and Actuators A Physical · 2012 · 138 citations
Materials Science, Energy Harvesting, Engineering +5
Fabrication of 3-in GaN substrates by hydride vapor phase epitaxy using void-assisted separation method
Takehiro Yoshida, Yuichi Oshima, Takeshi Eri et al. · Journal of Crystal Growth · 2007 · 125 citations
Materials Science, Wide-bandgap Semiconductor, Electrical Engineering +10
Over 3.0 $\hbox{GW/cm}^{2}$ Figure-of-Merit GaN p-n Junction Diodes on Free-Standing GaN Substrates
Yoshitomo Hatakeyama, Kazuki Nomoto, Naoki Kaneda et al. · IEEE Electron Device Letters · 2011 · 123 citations
Semiconductors, Semiconductor Technology, Electrical Engineering +11
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