D. Moy

A high-performance 0.25- mu m CMOS technology. II. Technology

B. Davari, Wei‐Hsu Chang, Karen Petrillo et al. · IEEE Transactions on Electron Devices · 1992 · 102 citations

Engineering, Electrical Engineering, Microelectronics +16

High performance 0.1 μm CMOS devices with 1.5 V power supply

Y. Taur, Shalom J. Wind, Y. J. Mii et al. · 2002 · 92 citations

Engineering, Computer Engineering, Electrical Engineering +17

Electrically Programmable Fuse (eFUSE): From Memory Redundancy to Autonomic Chips

Norm Robson, John Safran, C. Kothandaraman et al. · 2007 · 81 citations

Engineering, Computer Engineering, Electrical Engineering +7

Source—Drain contact resistance in CMOS with self-aligned TiSi₂

Yuan Taur, J.Y.-C. Sun, D. Moy et al. · IEEE Transactions on Electron Devices · 1987 · 56 citations

Engineering, Electrical Engineering, Materials Science +17

Mainstreaming of the SOI technology

G. Shahidi, Hellen Lo, M. Maloney et al. · 1999 · 39 citations

Engineering, Electrical Engineering, Materials Science +12