C. Kothandaraman

Electrically programmable fuse (eFUSE) using electromigration in silicides

C. Kothandaraman, S.K. Iyer, Shankar S. Iyer · IEEE Electron Device Letters · 2002 · 129 citations

Materials Science, Electrometallurgy, Electrical Engineering +13

A cost effective 32nm high-K/ metal gate CMOS technology for low power applications with single-metal/gate-first process

X. Chen, S. Samavedam, Vijay Narayanan et al. · 2008 · 112 citations

Low-power Electronics, Low Power Applications, Electrical Engineering +14

3D copper TSV integration, testing and reliability

Mukta Farooq, Troy Graves-Abe, W. Landers et al. · 2011 · 106 citations

3D Ic Architecture, Electrical Engineering, Engineering +15

Electrically Programmable Fuse (eFUSE): From Memory Redundancy to Autonomic Chips

Norm Robson, John Safran, C. Kothandaraman et al. · 2007 · 80 citations

Hardware Security, Electrical Engineering, Manycore Processor +14

Modified donor–acceptor pair luminescence in heavily nitrogen-doped zinc selenide

C. Kothandaraman, G. F. Neumark, R. M. Park · Applied Physics Letters · 1995 · 29 citations

Nitrogen-doped Zinc Selenide, Optical Materials, Engineering +18