Takao Amazawa - Concepedia

Author

Takao Amazawa

NTT (Japan)

Also Known As

T. Amazawa, Takao AMAZAWA, Takao Amazawa

Publications

272

Citations

H-Index

Concepts

All Affiliations

NTT (Japan)NTT Basic Research Laboratories

About

Takao Amazawa is an author at NTT (Japan) specializing in engineering, applied physics, and materials science.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	9	9	152
2	Applied Physics	9	9	152
3	Chemical Engineering	2	2	26
4	Chemistry	1	1	12
5	Computer Engineering	1	1	19

Takao Amazawa

Publications

152

Citations

H-Index

Page 1

	Year	Citations
Ultrathin oxide films deposited using electron cyclotron resonance sputter Takao Amazawa, Toshiro Ono, Masaru Shimada, Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena Materials ScienceElectrical EngineeringEngineeringNanotechnologyMinimum Thickness	1999	35
Selective Titanium Silicide Chemical Vapor Deposition with Surface Cleaning by Silane and Ohmic Contact Formation to Very Shallow Junctions Kunio Saito, Takao Amazawa, Yoshinobu Arita Journal of The Electrochemical Society Shallow JunctionsEngineeringIntegrated CircuitsThin Film Process TechnologyChemical Deposition	1993	19
A high speed molybdenum gate MOS RAM Masaki Kondo, T. Mano, F. Yanagawa, IEEE Journal of Solid-State Circuits Non-volatile MemoryElectrical EngineeringEngineeringNanoelectronicsEmerging Memory Technology	1978	19
Surface State Generation of Mo Gate Metal Oxide Semiconductor Devices Caused by Mo Penetration into Gate Oxide Takao Amazawa, Hideo Oikawa Journal of The Electrochemical Society EngineeringGate MetalThin Film Process TechnologySurface State GenerationSemiconductor Device	1998	18
Effect of Silicon Surface Cleaning on the Initial Stage of Selective Titanium Silicide Chemical Vapor Deposition Kunio Saito, Takao Amazawa, Yoshinobu Arita Japanese Journal of Applied Physics EngineeringSilicon Surface CleaningThin Film Process TechnologyChemical DepositionSilicon On Insulator	1990	14
A MoSi<sub>2</sub>Schottky diode for bipolar LSI's Y. Yamamoto, H. Miyanaga, Takao Amazawa, IEEE Transactions on Electron Devices SemiconductorsSemiconductor TechnologyElectrical EngineeringEngineeringBipolar Lsi	1985	13
Tantalum and tantalum nitride films deposited by electron cyclotron resonance sputtering as barriers to copper diffusion Toshiro Ono, Takao Amazawa, Hiroshi Nishimura, Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena Materials ScienceEngineeringTan FilmsSurface ScienceApplied Physics	1999	12
Reaction and Film Properties of Selective Titanium Silicide Low‐Pressure Chemical Vapor Deposition Kunio Saito, Yasuhiro Higashi, Takao Amazawa, Journal of The Electrochemical Society Gas SystemEngineeringNative OxideThin Film Process TechnologyChemistry	1994	12
Ultrathin Al2O3 and AlN films deposited by reactive sputter using advanced electron cyclotron resonance plasma source Masaru Shimada, Takao Amazawa, Takahito Ono, Vacuum Materials ScienceAluminium NitridePlasma ElectronicsEngineeringPhysics	2000	10

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