Takao Amazawa

Ultrathin oxide films deposited using electron cyclotron resonance sputter

Takao Amazawa, Toshiro Ono, Masaru Shimada et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1999 · 35 citations · Full text

Materials Science, Electrical Engineering, Engineering +12

Selective Titanium Silicide Chemical Vapor Deposition with Surface Cleaning by Silane and Ohmic Contact Formation to Very Shallow Junctions

Kunio Saito, Takao Amazawa, Yoshinobu Arita · Journal of The Electrochemical Society · 1993 · 19 citations

Shallow Junctions, Engineering, Integrated Circuits +19

A high speed molybdenum gate MOS RAM

Masaki Kondo, T. Mano, F. Yanagawa et al. · IEEE Journal of Solid-State Circuits · 1978 · 19 citations

Non-volatile Memory, Electrical Engineering, Engineering +11

Surface State Generation of Mo Gate Metal Oxide Semiconductor Devices Caused by Mo Penetration into Gate Oxide

Takao Amazawa, Hideo Oikawa · Journal of The Electrochemical Society · 1998 · 18 citations

Engineering, Gate Metal, Thin Film Process Technology +19

Effect of Silicon Surface Cleaning on the Initial Stage of Selective Titanium Silicide Chemical Vapor Deposition

Kunio Saito, Takao Amazawa, Yoshinobu Arita · Japanese Journal of Applied Physics · 1990 · 14 citations

Engineering, Silicon Surface Cleaning, Thin Film Process Technology +17