Concepedia

Hideo Oikawa

HO

Statistics

Publications

9

Citations

228

H-Index

9

Active since

1971

Affiliations

NTT (Japan)(Current)

Hideo Oikawa is an author at NTT (Japan) specializing in materials science, natural sciences, and thin-film deposition.

Publications per year

1971–2004

9

Publications

9

SiO2 planarization technology with biasing and electron cyclotron resonance plasma deposition for submicron interconnections

Katsuyuki Machida, Hideo Oikawa · Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena · 1986 · 58 citations

, , +16

Electrical resistivity of vaccum-deposited molybdenum films

Hideo Oikawa, Takaakira Tsuchiya · Journal of Vacuum Science and Technology · 1978 · 40 citations

, , +17

Ultrathin oxide films deposited using electron cyclotron resonance sputter

Takao Amazawa, Toshiro Ono, Masaru Shimada et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1999 · 35 citations · Full text

, , +17

Effect of heat treatment after deposition on internal stress in molybdenum films on SiO2/Si substrates

Hideo Oikawa, Yuji Nakajima · Journal of Vacuum Science and Technology · 1977 · 25 citations

, , +17

Surface State Generation of Mo Gate Metal Oxide Semiconductor Devices Caused by Mo Penetration into Gate Oxide

Takao Amazawa, Hideo Oikawa · Journal of The Electrochemical Society · 1998 · 18 citations

, , +17

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