Shusuke Yoshitake

RESCAN: an actinic lensless microscope for defect inspection of EUV reticles

Iacopo Mochi, Patrick Helfenstein, István Mohácsi et al. · Journal of Micro/Nanolithography MEMS and MOEMS · 2017 · 32 citations · Full text

Engineering, Microscopy, High Throughput +21

Actinic inspection of EUV reticles with arbitrary pattern design

Iacopo Mochi, Patrick Helfenstein, Yasin Ekinci et al. · 2017 · 19 citations

Engineering, Microscopy, Demo Tool +21

Reduction of long range fogging effect in a high acceleration voltage electron beam mask writing system

Munehiro Ogasawara, Naoharu Shimomura, Jun Takamatsu et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1999 · 18 citations

Electrical Engineering, Engineering, Electron Beam Mask +12

Reduction of fogging effect caused by scattered electrons in an electron beam system

Naoharu Shimomura, Munehiro Ogasawara, Jun Takamatsu et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1999 · 11 citations

Electrical Engineering, Engineering, Electron-beam Lithography +15

Advanced electron-beam writing system EX-11 for next-generation mask fabrication

Toru Tojo, Ryoji Yoshikawa, Yoji Ogawa et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1999 · 11 citations

Engineering, Electron-beam Lithography, Target Fabrication +16