Shigehiro Hara

Computer Aided Design Software for Designing Phase-Shifting Masks

Kazuko Ooi, Shigehiro Hara, Kiyomi Koyama · Japanese Journal of Applied Physics · 1993 · 28 citations

Engineering, Electronic Design Automation, Electronic Design +21

Mask process correction (MPC) modeling and its application to EUV mask for electron beam mask writer EBM-7000

Takashi Kamikubo, Takayuki Ohnishi, Shigehiro Hara et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2010 · 17 citations

Electrical Engineering, Engineering, Electron-beam Lithography +10

Advanced electron-beam writing system EX-11 for next-generation mask fabrication

Toru Tojo, Ryoji Yoshikawa, Yoji Ogawa et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1999 · 11 citations

Engineering, Electron-beam Lithography, Target Fabrication +16

EBM-5000: electron-beam mask writer for 45-nm node

H. Sunaoshi, Yuichi Tachikawa, Hitoshi Higurashi et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2006 · 10 citations

Electrical Engineering, Electron-beam Mask Writer, New Technologies +12