Jan Hermans

Extreme ultraviolet lithography at IMEC: Shadowing compensation and flare mitigation strategy

Gian F. Lorusso, A. M. Goethals, R. Jonckheere et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2007 · 30 citations

Engineering, Extreme Ultraviolet Lithography, Beam Lithography +12

EUV lithography program at IMEC

A. M. Goethals, R. Jonckheere, Gian F. Lorusso et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2007 · 28 citations

Optical Materials, Engineering, Electron-beam Lithography +16

Intra-field stress impact on global wafer deformation

Richard J. F. van Haren, Ronald Otten, Subodh Sourabh Singh et al. · 2019 · 27 citations

Experimental validation of full-field extreme ultraviolet lithography flare and shadowing corrections

Alan Myers, Gian F. Lorusso, In‐Hui Kim et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2008 · 20 citations

Optical Materials, Engineering, Electron-beam Lithography +19

Mandrel-based patterning: density multiplication techniques for 15nm nodes

Chris Bencher, Huixiong Dai, Liyan Miao et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2011 · 20 citations

Engineering, Advanced Computing, Pattern Transfer +20