Extreme ultraviolet lithography at IMEC: Shadowing compensation and flare mitigation strategy

Gian F. Lorusso, A. M. Goethals, R. Jonckheere, +7

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena

EngineeringExtreme Ultraviolet LithographyBeam LithographyMicrofabricationOptical Properties +10

EUV lithography program at IMEC

A. M. Goethals, R. Jonckheere, Gian F. Lorusso, +11

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Optical MaterialsEngineeringElectron-beam LithographyOptical TestingComputer-aided Design +14

Intra-field stress impact on global wafer deformation

Richard J. F. van Haren, Ronald Otten, Subodh Sourabh Singh, +7

Experimental validation of full-field extreme ultraviolet lithography flare and shadowing corrections

Alan Myers, Gian F. Lorusso, In‐Hui Kim, +5

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena

Optical MaterialsEngineeringElectron-beam LithographyExperimental ValidationOptic Design +17

Mandrel-based patterning: density multiplication techniques for 15nm nodes

Chris Bencher, Huixiong Dai, Liyan Miao, +11

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

EngineeringAdvanced ComputingPattern TransferDensity Multiplication TechniquesComputer-aided Design +18

Status of EUV lithography at IMEC

A. M. Goethal, R. Jockheere, C. F. Lurusso, +8

Journal of Photopolymer Science and Technology

Electrical EngineeringEngineeringInterference LithographyAlpha Demo ToolMicrofabrication +13

Readiness of EUV Lithography for Insertion into Manufacturing: The IMEC EUV Program

Eric Hendrickx, Roel Gronheid, Jan Hermans, +7

Journal of Photopolymer Science and Technology

EngineeringElectron-beam LithographyElectronic Design AutomationEuv LithographyImec Euv Program +18

Imaging performance of the EUV alpha semo tool at IMEC

Gian F. Lorusso, Jan Hermans, A. M. Goethals, +13

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

EngineeringElectron-beam LithographyInstrumentation EngineeringWafer Scale ProcessingBeam Lithography +20

Progress in EUV lithography towards manufacturing from an exposure tool perspective

Jan Hermans, David Laidler, Philippe Foubert, +4

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Optical MaterialsEngineeringElectron-beam LithographyTarget FabricationExposure Tool Perspective +21

Compensation of overlay errors due to mask bending and non-flatness for EUV masks

Manish Chandhok, Sanjay Goyal, Steven L. Carson, +13

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

EngineeringElectron-beam LithographyBeam LithographyAdvanced Packaging (Semiconductors)Applied Physics +9