I. Suni

Reactive sputter deposition and properties of TaxN thin films

Tommi Riekkinen, J. M. Molarius, Tomi Laurila et al. · Microelectronic Engineering · 2002 · 159 citations

Materials Science, Materials Engineering, Engineering +6

Compensating impurity effect on epitaxial regrowth rate of amorphized Si

I. Suni, G. Göltz, M. G. Grimaldi et al. · Applied Physics Letters · 1982 · 128 citations

Materials Science, Semiconductors, Ion Implantation +11

Effects of electrically active impurities on the epitaxial regrowth rate of amorphized silicon and germanium

I. Suni, G. Göltz, M‐A. Nicolet et al. · Thin Solid Films · 1982 · 107 citations

Amorphized Silicon, Physics, Intrinsic Impurity +7

Thermal Oxidation of Reactively Sputtered Titanium Nitride and Hafnium Nitride Films

I. Suni, D. Sigurd, K. T. Ho et al. · Journal of The Electrochemical Society · 1983 · 93 citations

Engineering, Oxidation Resistance, Thermal Oxidation +16

Failure mechanism of Ta diffusion barrier between Cu and Si

Tomi Laurila, Kejun Zeng, J.K. Kivilahti et al. · Journal of Applied Physics · 2000 · 89 citations

Engineering, Chemical Deposition, Silicon On Insulator +16