Martin Seamons

Remote microwave plasma source for cleaning chemical vapor deposition chambers: Technology for reducing global warming gas emissions

S. Raoux, Tom Tanaka, Mohan Krishan Bhan et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1999 · 88 citations

Engineering, Chemical Engineering, Manufacturing Engineering +14

Stress Management in Sub-90-nm Transistor Architecture

Reza Arghavani, Zhaohe Yuan, Nilesh P. Ingle et al. · IEEE Transactions on Electron Devices · 2004 · 41 citations

Engineering, Electrical Engineering, Materials Science +17

Advance Process Control solutions for semiconductor manufacturing

M. Sarfaty, A. Shanmugasundram, Alexander T. Schwarm et al. · 2003 · 17 citations

Engineering, Manufacturing Engineering, Systems Engineering +17

An automatic scanning device for nuclear track plates

E.R. Flynn, Tom Gardiner, Martin Seamons et al. · Nuclear Instruments and Methods · 1971 · 13 citations

Engineering, Nuclear Engineering, Nuclear Instrumentation +10

Defect Gallery and Bump Defect Reduction in the Self-Aligned Double Patterning Module

Cathy Cai, Deenesh Padhi, Martin Seamons et al. · IEEE Transactions on Semiconductor Manufacturing · 2011 · 10 citations

Engineering, Manufacturing Engineering, Materials Science +17