Mohan Krishan Bhan - Concepedia

Author

Mohan Krishan Bhan

Indian Institute of Technology Delhi

Also Known As

M. Bhan, M.K. Bhan, Mohan Bhan, Mohan K Bhan, Mohan K. Bhan, Mohan Krishan Bhan

Publications

258

Citations

H-Index

Concepts

All Affiliations

Indian Institute of Technology Delhi Applied Materials (United States)

About

Mohan Krishan Bhan is an author at Indian Institute of Technology Delhi specializing in engineering, thin films, and applied physics.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	6	6	236
2	Applied Physics	5	5	151
3	Chemical Engineering	2	2	129
4	Chemistry	2	2	88
5	Electrical Engineering	2	2	100

Mohan Krishan Bhan

Publications

236

Citations

H-Index

Page 1

	Year	Citations
Remote microwave plasma source for cleaning chemical vapor deposition chambers: Technology for reducing global warming gas emissions S. Raoux, Tom Tanaka, Mohan Krishan Bhan, Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena Pfc UsageChemical EngineeringElectrical EngineeringEngineeringEnvironmental Engineering	1999	85
Chemical and morphological changes on silver surfaces produced by microwave generated atomic oxygen Mohan Krishan Bhan, Pallob K. Nag, George P. Miller, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films EngineeringOxidation ResistanceMetallic NanomaterialsChemistryChemical Engineering	1994	44
Deposition of stable, low κ and high deposition rate SiF4-doped TEOS fluorinated silicon dioxide (SiOF) films Mohan Krishan Bhan, Judy H. Huang, David L. Cheung Thin Solid Films Materials ScienceLow κEngineeringSurface ScienceApplied Physics	1997	44
Growth of high quality amorphous silicon films with significantly improved stability Vikram L. Dalal, E. X. Ping, Sanjeev Kaushal, Applied Physics Letters Materials ScienceMaterials EngineeringSemiconductorsEngineeringPhysics	1994	33
Electrical, optical, and structural properties of reactive ion beam sputtered hydrogenated amorphous germanium (<i>a</i>-Ge:H) films Mohan Krishan Bhan, L.K. Malhotra, Subhash C. Kashyap Journal of Applied Physics Optical MaterialsEngineeringOptoelectronic DevicesThin Film Process TechnologySemiconductors	1989	15
Electrical and optical properties of hydrogenated amorphous silicon-germanium (<i>a</i>-Si1−<i>x</i>Ge<i>x</i>:H) films prepared by reactive ion beam sputtering Mohan Krishan Bhan, L.K. Malhotra, Subhash C. Kashyap Journal of Applied Physics Optical MaterialsEngineeringGermanium ContentOptoelectronic DevicesThin Film Process Technology	1989	15

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