Mohan Krishan Bhan

Remote microwave plasma source for cleaning chemical vapor deposition chambers: Technology for reducing global warming gas emissions

S. Raoux, Tom Tanaka, Mohan Krishan Bhan et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1999 · 85 citations

Pfc Usage, Chemical Engineering, Electrical Engineering +9

Chemical and morphological changes on silver surfaces produced by microwave generated atomic oxygen

Mohan Krishan Bhan, Pallob K. Nag, George P. Miller et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1994 · 44 citations

Engineering, Oxidation Resistance, Metallic Nanomaterials +16

Deposition of stable, low κ and high deposition rate SiF4-doped TEOS fluorinated silicon dioxide (SiOF) films

Mohan Krishan Bhan, Judy H. Huang, David L. Cheung · Thin Solid Films · 1997 · 44 citations

Materials Science, Low κ, Engineering +9

Growth of high quality amorphous silicon films with significantly improved stability

Vikram L. Dalal, E. X. Ping, Sanjeev Kaushal et al. · Applied Physics Letters · 1994 · 33 citations

Materials Science, Materials Engineering, Semiconductors +14

Electrical, optical, and structural properties of reactive ion beam sputtered hydrogenated amorphous germanium (<i>a</i>-Ge:H) films

Mohan Krishan Bhan, L.K. Malhotra, Subhash C. Kashyap · Journal of Applied Physics · 1989 · 15 citations

Optical Materials, Engineering, Optoelectronic Devices +20