Publication | Closed Access
Deposition of stable, low κ and high deposition rate SiF4-doped TEOS fluorinated silicon dioxide (SiOF) films
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Citations
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References
1997
Year
Materials ScienceLow κEngineeringSurface ScienceApplied PhysicsSemiconductor Device FabricationThin Film Process TechnologyChemistryThin FilmsChemical Vapor DepositionThin Film ProcessingSilicon Dioxide
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