Anna Tchikoulaeva

Integration of EUV lithography in the fabrication of 22-nm node devices

Obert R. Wood, Chiew-Seng Koay, Karen Petrillo et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2009 · 49 citations · Full text

The use of EUV lithography to produce demonstration devices

Bruno LaFontaine, Yunfei Deng, Ryoung-Han Kim et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2008 · 42 citations

EUV actinic blank inspection: from prototype to production

Anna Tchikoulaeva, Hiroki Miyai, Tomohiro Suzuki et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2013 · 38 citations

Actinic Metrology Tools, Engineering, Inspection +10

ACLV degradation: root cause analysis and effective monitoring strategy

Anna Tchikoulaeva, Andre Holfeld, Markus Arend et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2008 · 12 citations

Electrical Engineering, Reliability Engineering, Optical Materials +15

Enabling EUVL high-volume manufacturing with actinic patterned mask inspection

Anna Tchikoulaeva, Hiroki Miyai, Tsunehito Kohyama et al. · 2020 · 12 citations