Anita Fumar-Pici

EUV resist performance: current assessment for sub-22-nm half-pitch patterning on NXE:3300

Tom Wallow, Deniz Civay, S. Wang et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2012 · 25 citations

Euv Resist Performance, Engineering, Electron-beam Lithography +16

EUV stochastic noise analysis and LCDU mitigation by etching on dense contact-hole array patterns

Seo Min Kim, Sunyoung Koo, Jun-Taek Park et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2014 · 19 citations

Electrical Engineering, Engineering, Electron-beam Lithography +15

Study of the influence of substrate topography on the focusing performance of advanced lithography scanners

Bruno M. La Fontaine, Jan Hauschild, Mircea Dusa et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2003 · 10 citations

Engineering, Electron-beam Lithography, Microscopy +18

Understanding of stochastic noise

Seo-Min Kim, Chang-Moon Lim, Mi-Rim Jung et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2015 · 10 citations

Engineering, Electron-beam Lithography, Microscopy +19