P. Ranson

Passivation mechanisms in cryogenic SF₆/O₂etching process

Rémi Dussart, Mohamed Boufnichel, G. Marcos et al. · Journal of Micromechanics and Microengineering · 2003 · 106 citations

Engineering, Materials Engineering, Materials Science +17

Si O x F y passivation layer in silicon cryoetching

X. Mellhaoui, Rémi Dussart, Thomas Tillocher et al. · Journal of Applied Physics · 2005 · 97 citations

Engineering, Materials Engineering, Materials Science +17

Profile control of high aspect ratio trenches of silicon. I. Effect of process parameters on local bowing

Mohamed Boufnichel, S. Aachboun, F. Grangeon et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2002 · 96 citations

Engineering, Materials Engineering, Materials Science +14

Deep anisotropic etching of silicon

S. Aachboun, P. Ranson · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1999 · 93 citations

Engineering, Materials Engineering, Materials Science +17

Silicon columnar microstructures induced by an SF₆/O₂plasma

Rémi Dussart, X. Mellhaoui, Thomas Tillocher et al. · Journal of Physics D Applied Physics · 2005 · 89 citations

Natural Sciences, Materials Science, Physics +17