Chris Bevis

REBL: design progress toward 16 nm half-pitch maskless projection electron beam lithography

M. A. McCord, Paul Petric, Upendra Ummethala et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2012 · 42 citations

Engineering, Electrical Engineering, Digital Fabrication +14

REBL: A novel approach to high speed maskless electron beam direct write lithography

Paul Petric, Chris Bevis, Allen Carroll et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2009 · 34 citations

Engineering, Computer Engineering, Electrical Engineering +10

REBL nanowriter: Reflective Electron Beam Lithography

Paul Petric, Chris Bevis, Alan D. Brodie et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2009 · 33 citations · Full text

Engineering, Computer Engineering, Electrical Engineering +12

Reflective electron beam lithography: A maskless ebeam direct write lithography approach using the reflective electron beam lithography concept

Paul Petric, Chris Bevis, M. A. McCord et al. · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena · 2010 · 23 citations

Engineering, Manufacturing Engineering, Materials Science +12

Reflective electron-beam lithography: progress toward high-throughput production capability

Regina Freed, Thomas Gubiotti, Jeff Sun et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2012 · 21 citations

Engineering, Electrical Engineering, Manufacturing Engineering +12