Paul Petric

Projection reduction exposure with variable axis immersion lenses: Next generation lithography

H. C. Pfeiffer, R. S. Dhaliwal, S. D. Golladay et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1999 · 61 citations

Natural Sciences, Manufacturing Engineering, Biomedical Optics +11

REBL: design progress toward 16 nm half-pitch maskless projection electron beam lithography

M. A. McCord, Paul Petric, Upendra Ummethala et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2012 · 42 citations

Engineering, Electrical Engineering, Digital Fabrication +14

REBL: A novel approach to high speed maskless electron beam direct write lithography

Paul Petric, Chris Bevis, Allen Carroll et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2009 · 34 citations

Engineering, Computer Engineering, Electrical Engineering +10

REBL nanowriter: Reflective Electron Beam Lithography

Paul Petric, Chris Bevis, Alan D. Brodie et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2009 · 33 citations · Full text

Engineering, Computer Engineering, Electrical Engineering +12

Reflective electron beam lithography: A maskless ebeam direct write lithography approach using the reflective electron beam lithography concept

Paul Petric, Chris Bevis, M. A. McCord et al. · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena · 2010 · 23 citations

Engineering, Manufacturing Engineering, Materials Science +12