Bart Onsia

Deposition of HfO2 on germanium and the impact of surface pretreatments

Sven Van Elshocht, Bert Brijs, Matty Caymax et al. · Applied Physics Letters · 2004 · 106 citations

Engineering, Chemistry, Chemical Deposition +20

Atomic layer deposition of hafnium oxide on germanium substrates

Annelies Delabie, Riikka L. Puurunen, Bert Brijs et al. · Journal of Applied Physics · 2005 · 101 citations

Engineering, Hfo2 Layers, Closed Hfo2 Layer +17

A Study of the Influence of Typical Wet Chemical Treatments on the Germanium Wafer Surface

Bart Onsia, Thierry Conard, Stefan De Gendt et al. · Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena · 2005 · 81 citations

Engineering, Belgium 2, Chemistry +16

On the Application of a Thin Ozone Based Wet Chemical Oxide as an Interface for ALD High-k Deposition

Bart Onsia, Matty Caymax, Thierry Conard et al. · Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena · 2005 · 48 citations

Engineering, Chemistry, Thin Ozone +17

Performance comparison of sub 1 nm sputtered TiN/HfO/sub 2/ nMOS and pMOSFETs

Wu‐ting Tsai, L.-Å. Ragnarsson, L. Pantisano et al. · 2004 · 34 citations

Materials Science, Electrical Engineering, Vfb Extraction +13