Trace Hurd

Diffusion Studies of Copper on Ruthenium Thin Film

Raymond Chan, Tiruchirapalli Arunagiri, Y. Zhang et al. · Electrochemical and Solid-State Letters · 2004 · 166 citations

Natural Sciences, Materials Engineering, Materials Science +17

A Novel Dry Selective Etch of SiGe for the Enablement of High Performance Logic Stacked Gate-All-Around NanoSheet Devices

N. Loubet, Subhadeep Kal, Cheryl Alix et al. · 2019 · 87 citations

Engineering, Electrical Engineering, Materials Science +16

Impact of Fe and Cu Contamination on the Minority Carrier Lifetime of Silicon Substrates

Antonio Rotondaro, Trace Hurd, A. Kaniava et al. · Journal of The Electrochemical Society · 1996 · 55 citations

Engineering, Electrical Engineering, Materials Science +17

Demonstration of a 4 Mb, high density ferroelectric memory embedded within a 130 nm, 5 LM Cu/FSG logic process

T. S. Moise, Scott R. Summerfelt, H. McAdams et al. · 2003 · 50 citations

Engineering, Computer Engineering, Electrical Engineering +14

H₂O₂ Decomposition and Its Impact on Silicon Surface Roughening and Gate Oxide Integrity

H. Schmidt, Marc Meuris, Paul Mertens et al. · Japanese Journal of Applied Physics · 1995 · 37 citations

Natural Sciences, Materials Engineering, Materials Science +17