H. Schmidt

Ultrathin high-K metal oxides on silicon: processing, characterization and integration issues

E. P. Gusev, E. Cartier, D. A. Buchanan et al. · Microelectronic Engineering · 2001 · 386 citations

Natural Sciences, Materials Engineering, Materials Science +12

Physical and electrical characterization of Hafnium oxide and Hafnium silicate sputtered films

Agnese Callegari, E. Cartier, M. Gribelyuk et al. · Journal of Applied Physics · 2001 · 265 citations

Natural Sciences, Materials Engineering, Materials Science +17

Ultrathin high-K gate stacks for advanced CMOS devices

E. P. Gusev, D. A. Buchanan, E. Cartier et al. · 2002 · 196 citations

Engineering, Electrical Engineering, Materials Science +17

Characterization of silicon surface preparation processes for advanced gate dielectrics

H. Schmidt · IBM Journal of Research and Development · 1999 · 133 citations

Natural Sciences, Materials Engineering, Materials Science +17

High mobility p-channel germanium MOSFETs with a thin Ge oxynitride gate dielectric

Huiling Shang, H. Schmidt, K. Chan et al. · 2003 · 120 citations

Engineering, Electrical Engineering, Materials Science +16