Subhadeep Kal

A Novel Dry Selective Etch of SiGe for the Enablement of High Performance Logic Stacked Gate-All-Around NanoSheet Devices

N. Loubet, Subhadeep Kal, Cheryl Alix et al. · 2019 · 81 citations

Engineering, Vlsi Design, Gate-all-around Nanosheet Devices +17

Self-aligned quadruple patterning integration using spacer on spacer pitch splitting at the resist level for sub-32nm pitch applications

Angélique Raley, Sophie Thibaut, Nihar Mohanty et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2016 · 24 citations

Engineering, Electron-beam Lithography, Resist Level +17

Nondestructive characterization of nanoscale subsurface features fabricated by selective etching of multilayered nanowire test structures using Mueller matrix spectroscopic ellipsometry based scatterometry

Madhulika Korde, Subhadeep Kal, Cheryl Alix et al. · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena · 2020 · 21 citations

Selective Etching, Engineering, Microscopy +24

Highly Selective SiGe Dry Etch Process for the Enablement of Stacked Nanosheet Gate-All-Around Transistors

Curtis Durfee, Subhadeep Kal, S. Pancharatnam et al. · ECS Transactions · 2021 · 14 citations

Strategies for aggressive scaling of EUV multi-patterning to sub-20 nm features

Ashim Dutta, Jennifer Church, Joe Lee et al. · 2020 · 12 citations