Angélique Raley

Self-aligned quadruple patterning integration using spacer on spacer pitch splitting at the resist level for sub-32nm pitch applications

Angélique Raley, Sophie Thibaut, Nihar Mohanty et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2016 · 24 citations

Engineering, Electron-beam Lithography, Resist Level +17

Challenges and mitigation strategies for resist trim etch in resist-mandrel based SAQP integration scheme

Nihar Mohanty, Elliott Franke, Eric Liu et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2015 · 17 citations

Resist Trim Etch, Electrical Engineering, Engineering +15

Strategies for aggressive scaling of EUV multi-patterning to sub-20 nm features

Ashim Dutta, Jennifer Church, Joe Lee et al. · 2020 · 12 citations

Outlook for high-NA EUV patterning: a holistic patterning approach to address upcoming challenges

Angélique Raley, Lior Huli, Steven Grzeskowiak et al. · 2022 · 12 citations

Engineering, Electron-beam Lithography, Electronic Design Automation +16

EPE improvement thru self-alignment via multi-color material integration

Nihar Mohanty, Jeffrey Smith, Lior Huli et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2017 · 10 citations