Concepedia

Lior Huli

LH

8

Publications

222

Citations

8

H-Index

2008

Active since

Affiliations

In-Q-Tel(Current)

Applied Materials (United States)

IBM (United States)

Tokyo Electron (Japan)

University at Albany, State University of New York

Lior Huli is an author at In-Q-Tel specializing in engineering, microelectronics, and computer engineering.

Top concepts

EngineeringMicroelectronicsComputer EngineeringApplied PhysicsMicrofabrication3D PrintingElectronic PackagingMaterials EngineeringElectrical EngineeringSurface Science

Publications per year

2008–2022

8

Publications

8

22nm half-pitch patterning by CVD spacer self alignment double patterning (SADP)

Chris Bencher, Yong Mei Chen, Huixiong Dai et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2008 · 128 citations

Physical Design (Electronics), Wafer Scale Processing, Engineering +15

EUV patterning successes and frontiers

Nelson Felix, Dan Corliss, Karen Petrillo et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2016 · 25 citations

Engineering, Electron-beam Lithography, Euv Patterning Successes +18

Driving down defect density in composite EUV patterning film stacks

Luciana Meli, Karen Petrillo, Anuja De Silva et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2017 · 13 citations

Engineering, Electron-beam Lithography, Defect Tolerance +20

Defect detection strategies and process partitioning for single-expose EUV patterning

Luciana Meli, Karen Petrillo, Anuja De Silva et al. · Journal of Micro/Nanolithography MEMS and MOEMS · 2018 · 12 citations

Engineering, Electron-beam Lithography, Single-expose Euv Patterning +17

Strategies for aggressive scaling of EUV multi-patterning to sub-20 nm features

Ashim Dutta, Jennifer Church, Joe Lee et al. · 2020 · 12 citations

Rows per page

1–5 of 8