Gate-all-around MOSFETs based on vertically stacked horizontal Si nanowires in a replacement metal gate process on bulk Si substrates

Hans Mertens, R. Ritzenthaler, Andriy Hikavyy, +25

EngineeringSi NwsBulk Si SubstratesIntegrated CircuitsSilicon On Insulator +14

Electronic structure and spectrum of UO22+ and UO2Cl42−

Kristine Pierloot, Els Van Besien

The Journal of Chemical Physics

Transition Metal ChalcogenidesInorganic ChemistryElectronic SpectraTheoretical StudyEngineering +12

Electronic spectrum of UO22+ and [UO2Cl4]2− calculated with time-dependent density functional theory

Kristine Pierloot, Els Van Besien, Erik van Lenthe, +1

The Journal of Chemical Physics

Caspt2 MethodExcited State PropertyEngineeringPhysicsNatural Sciences +13

Implementation of an industry compliant, 5×50μm, via-middle TSV technology on 300mm wafers

A. Redolfi, Dimitrios Velenis, Sarasvathi Thangaraju, +17

EngineeringSilicon ViasIntegrated CircuitsInterconnect (Integrated Circuits)Cmos Flow +16

Effect of porogen residue on electrical characteristics of ultra low-k materials

Mikhaı̈l R. Baklanov, Larry Zhao, Els Van Besien, +1

Microelectronic Engineering

Materials EngineeringMaterials ScienceElectrical EngineeringElectrical CharacteristicsEngineering +7

Conformational analysis of a trihydroxylated derivative of cinnamic acid—a combined Raman spectroscopy and Ab initio study

Sónia M. Fiuza, Els Van Besien, Nuno Milhazes, +2

Journal of Molecular Structure

Molecular SpectroscopyBiochemistryNatural SciencesSpectroscopyStructure Elucidation +6

Influence of porosity on electrical properties of low-k dielectrics

Els Van Besien, Marianna Pantouvaki, Larry Zhao, +4

Microelectronic Engineering

Materials ScienceElectrical EngineeringDielectricsEngineeringPorosity +4

Effect of UV wavelength on the hardening process of porogen-containing and porogen-free ultralow-k plasma-enhanced chemical vapor deposition dielectrics

Adam Urbanowicz, Kris Vanstreels, Patrick Verdonck, +5

Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena

Optical MaterialsEngineeringThin Film Process TechnologyChemical DepositionUv Wavelength +16

Electronic spectra of uranyl chloride complexes in acetone: a CASSCF/CASPT2 investigation

Els Van Besien, Kristine Pierloot, Christiane Görller‐Walrand

Physical Chemistry Chemical Physics

Epitaxial diamond-hexagonal silicon nano-ribbon growth on (001) silicon

Yu Qiu, H. Bender, Olivier Richard, +6

Scientific Reports

Materials ScienceDiamond-like CarbonEngineeringDiamond-hexagonal SiliconCrystalline Defects +11