Kenji Hoshiko

Novel EUV resist development for sub-14nm half pitch

Masafumi Hori, Takehiko Naruoka, Hisashi Nakagawa et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2015 · 25 citations

Engineering, Electrical Engineering, Manufacturing Engineering +13

Novel EUV Resist Development for Sub-14nm Half Pitch

Takakazu Kimoto, Takehiko Naruoka, Hisashi Nakagawa et al. · Journal of Photopolymer Science and Technology · 2015 · 24 citations · Full text

Engineering, Electrical Engineering, Manufacturing Engineering +13

Double patterning process with freezing technique

Goji Wakamatsu, Yusuke Anno, Masafumi Hori et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2009 · 24 citations

Engineering, Manufacturing Engineering, Materials Science +8

Novel EUV resist materials for 16nm half pitch and EUV resist defects

Motohiro Shiratani, Takehiko Naruoka, Ken Maruyama et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2014 · 20 citations

Engineering, Materials Engineering, Materials Science +14

XAS photoresists electron/quantum yields study with synchrotron light

Peter De Schepper, Alessandro Vaglio Pret, Terje Hansen et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2015 · 20 citations

Natural Sciences, Materials Engineering, Materials Science +15